reZolv Skincare uses the most ultimate and modern skincare technology for creating formulations unique to the world. Respecting the process of how the skin works, the formulations do not contain plants, botanicals, waxes, oils, drugs or harsh chemicals like Benzoyl Peroxide, Sulfur or Parabins, since none of these substances are indigenous of the human body.
Our NURTURE UR SKIN formulations contain active ingredients that are natural to the skin, such as lipids, carbohydrates, amino acids and others. These nutrients are physiologically produced by the human skin on its own and can therefore be considered “truly natural” for the human skin. Each of our products contain around 150 to 300 of these active nutrients which are specifically formulated for each product purpose. Most of our products are completely free of any drying chemicals, only our Acne labeled products (ACNE Spotter and ACNE Cream) contain the lowest dose of Salicylic Acid (0.5%) to comply with FDA regulations for Acne products.
Due to the fact that NURTURE UR SKIN ingredients are truly natural and indigenous to the human skin, they are easily absorbed and metabolized. They enable damaged skin cells to regenerate themselves and thus induce self-healing processes by just giving the skin what it really needs! There are no side effects as the concentration of bio-active complexes are within the natural range of comfort for the human skin.
reZolv Skincare products contain not a one miracle substance, but multiple proprietary nutrients that are 100% natural and found in your skin.
Short chain polypeptides, proteins and enzymes;
Unsaturated fatty acids, phytosterols, bioflavonoids, and enzymes;
Essential amino acids, nucleic acids, and bioactive carbohydrates;
Peptides and glycosoaminoglycans;
Natural antioxidants, bioflavonoids and water-soluble vitamins with their coenzymes;
Multiple vitamins and anti-free radical scavengers especially balanced for addressing the problems of the Acne skin;
Oligopeptides, and glycoproteins especially balanced for Acne skin.